Senior/Principal Engineer, Photo Equipment Development

As a Senior Equipment Engineer/Equipment Engineer in SG EDE Photolithography team, you will be expected to support R&D activities associated with rapid deployment of ASML or Cannon First-of-Kind equipment, the CIP hardware evaluations and managing on the timeline needed to deploy in current technode/next advance technode on time. Good team spirit and good collaborations working is needed with various stakeholders including (not limited to) facilities/fab support/Gas & Chemical/EHS/F4/F10/Central team etc with various equipment setup and improvement work necessitated thereof as well as to ensure extended engagement with F4 on the upcoming First-of-Kind equipment in upcoming technode. Expected to work independently with minimal direction and complete projects in a timely manner and achieve set objectives.

Responsibilities

Leading the design, development and characterization of new scanner (ASML/Cannon) tools and identifying and closing any hardware and procedural gaps.

Innovate solutions that enable best in class performance in Semiconductor Photolithography ASML/Cannon Tools

Oversee installation and upgrades of Semiconductor Photolithography ASML/Cannon tools ensuring quality of work, cost control and alignment to project schedule.

Engage Semiconductor Photolithography ASML/Cannon equipment vendors to improve current products and implement roadmap needs.

Work with Semiconductor Photolithography ASML/Cannon Process Engineers, Manufacturing, Procurement, and Vendor partners to develop a comprehensive package capable for our volume manufacturing sites.

Generating and maintaining documents that outline Semiconductor Photolithography ASML/Cannon equipment performance, operating procedures, maintenance specifications, and cost metrics.

Support Internal And External Audits

Requirements:

• Masters or >3 years of experience in the semiconductor industry in the area of Semiconductor Photolithography ASML/Cannon equipment engineer roles.

• In-depth understanding of the Semiconductor Photolithography ASML/Cannon equipment operation, working principles, troubleshooting and tool installation procedure is a must.

• Exposure to Semiconductor Photolithography ASML/Cannon R&D equipment transfer and ability to develop/optimize equipment hardware design is preferred.

• Communications and collaboration with partners both locally and globally. Strict adherence to Micron Intellectual Property protection policy is a must.

Requirements:

• Masters or >3 years of experience in the semiconductor industry in the area of equipment engineer roles.

• In-depth understanding of the equipment operation, working principles, troubleshooting and tool installation procedure is a must.

• Exposure to R&D equipment transfer and ability to develop/optimize equipment hardware design is preferred.

• Communications and collaboration with partners both locally and globally. Strict adherence to Micron Intellectual Property protection policy is a must.