SR Engineer - NAND Generators

As a Mask Generator Engineer within this organization you will be chartered with defining, generating and maintaining mask data for current and future NAND technologies.

You will be responsible for developing generator code to generate final mask data from drawn base layer data. You will use this code to build all masks for development of a new technology from initial development to production ramp. All mask data should be generated in a timely manner and error free. We also work closely with NAND PI, design rule, OPC process and tapeout team to improve the quality and efficiency of the business process by developing automation tools.

Your responsibilities may include, but are not limited to:

• Build NAND generators by coordination with PI, design, photo, mask shop, advanced mask group, frame group, etc.
• Understand design rules, OPC, database, layout, etc. and be able to inspect layout, fractured data for errors.
• Develop and write generators, review DRCs, etc.
• Develop experimental reticles for photo, PI, etc.
• Inspect and review databases through the tapeout processes
• Develop Tools and Flows Used in Physical Design, Functional and Physical Verification, Performance and Yield Optimization, and Tapeout

We are seeking candidates with the following:

• BS 10+ years’ experience or MS 5+ years’ experience in Computer Science or Computer Engineering, Electrical Engineering or Electronics Engineering
• Fundamental understanding of device structure, silicon processing, basic processing issues, and design rules that control them.
• Hands-on experience required in writing DRC runset using the Calibre SVRF/TVF/TCL
• Experienced with metal fill algorithm and dealing with density issues is plus
• Experienced with the Tapeout process and the LPP# (Layer Purpose Pair) usage
• Solid knowledge of computer programming and software: UNIX/Linux system, Python, Perl, Shell script, C/C++, SQL.
• Intimate knowledge of appropriate CAD tools: Cadence df2/SKILL/K2view and Calibredrv is preferred
• The ability to interface with a wide variety of people with different skill sets: design, process, process integration, OPC, layout CAD.
• The capability to supply innovative solutions to fix complex problems relating to generation of mask data.
• Experience in source code management and revision control system such as tool DesignSync and Perforce is plus
• Good communication and problem-solving skills are required
• Fluent in English and able to communicate effectively with a global team